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AEC/APC Symposium XXIV and ISMI Symposium on Manufacturing Effectiveness, Renaissance Austin Hotel, Austin, Texas, USA, November 2010
 
PRODUCT GUIDE
Hercules® at a Glance
Semiconductor Plasma Process Sensor
Photovoltaics Plasma Process Sensor
Total Process Control Solution
PLASMA PROCESS CONTROL
Plasma Control Concept
Plasma Metrology
Data Handling
EXPERIENCE & TRAINING
Training Concept
Plasma School
RF TECHNOLOGY and PROCESS SERVICES
RF Chamber Matching
Uniformity Improvement
Large Area Uniformity Simulation
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2010 © Plasmetrex GmbH

TRAINING CONCEPT

Courses:

 

The Plasmetrex Plasma Service Concept

Plasmetrex Plasma Service Concept

Audience: 

  • Process, maintenance, or equipment engineers (plasma etching, PECVD, sputtering)

Target: 

  • Basic knowledge of plasma processing and RF technology for every day usage in semiconductor manufacturing

Two Course Lectures:

  • Quality, knowlegde, and experience of lectures is at least as important as the quality of the training manual.

Features:

  • Comprehensive training manual
  • Certificate
  • Short final test 
  • Course evaluation

Videos:

  • Space charge sheath (dark space): Formation and structures
  • Effect of parameter variation in plasmas:
  • RF power and pressure
  • Particle transport and removal

Experiment:

  • Plasma and magnetic field (video alternatively)
  • Live plasma experiment shows interaction with a static
    magnetic field by rotation of the plasma (Faraday effect).

Plasma live experiment

Same principle as used in MERIE chambers as TEL™ DRM
and Applied Materials® - MxP family.