Audience:
- Process,
maintenance, or equipment engineers (plasma etching, PECVD, sputtering)
Target:
- Basic
knowledge of plasma processing and RF technology for every day usage in
semiconductor manufacturing
Two Course Lectures:
- Quality, knowlegde, and experience of lectures is at
least as important as the quality of the training manual.
Features:
- Comprehensive training manual
- Certificate
- Short final test
- Course evaluation
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Videos:
- Space charge sheath
(dark space): Formation and
structures
- Effect of parameter
variation in plasmas:
- RF power and pressure
- Particle transport
and removal
Experiment:
- Plasma and magnetic field (video alternatively)
- Live
plasma experiment shows
interaction with a static
magnetic field by rotation of the plasma
(Faraday effect).

Same
principle as used in MERIE chambers as TEL™ DRM
and
Applied Materials®
- MxP family. |