SENSOR for MEDIUM PRESSURE - 13.56 MHz

Product:

• Hercules^® N 100 (13.56 MHz, additional inductive coupling)

Application:

• Quality control
• Process development
• Product monitoring
• Maintenance

Parameters:

• Plasma bulk resistance
• RF current

Tools:

• Medium pressure tools for Plasma Etch and Plasma Enhanced Chemical Vapor Deposition

Model:

• NEED (Non-linear Extended Electron Dynamics) algorithm

Pressure range:

• Lower limit: 60 Pa (500 mTorr)
• Upper limit: 1 kPa (7.5 Torr)

Chamber setup:

• Cylindrical geometry, capacitive coupling

Flexible and small:

• 4.5 kg
• H: 210 mm, D: 250 mm, W: 210 mm
• 19" rack compatible