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NEW: LARGE AREA UNIFORMITY SIMULATION for a-Si LAYER THICKNESS, please see Large Area Uniformity Simulation
 
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2010 © Plasmetrex GmbH

HERCULES® N 250

SENSOR for MEDIUM PRESSURE DEPOSITION

Hercules N

Product:
  • Hercules® N 250

Application:
  • Quality control
  • Process development
  • Product monitoring
  • Maintenance

Main parameters:
  • Plasma bulk resistance
  • Electron collision rate
  • RF current

Tools:
  • Medium pressure tools for Plasma Etch and Plasma Enhanced Chemical Vapor Deposition, up to 40.68 MHz generator frequency

Model:
  • NEED (Non-linear Extended Electron Dynamics) algorithm

Pressure range:
  • Lower limit: 60 Pa (500 mTorr)
  • Upper limit: 1 kPa (7.5 Torr)

Chamber setup:
  • Cylindrical geometry, capacitive coupling

Flexible and small:
  • 4.5 kg
  • H: 210 mm, D: 250 mm, W: 210 mm
  • 19" rack compatible

Subject to technical alternations!