PRODUCT GUIDE

Hercules^® at a Glance

Semiconductor Plasma Process Sensor

Photovoltaics Plasma Process Sensor

Total Process Control Solution

PLASMA PROCESS CONTROL

Plasma Control Concept

Plasma Metrology

Data Handling

EXPERIENCE & TRAINING

Training Concept

Plasma School

RF TECHNOLOGY and PROCESS SERVICES

RF Chamber Matching

Uniformity Improvement

Large Area Uniformity Simulation

REFERENCES

Tool and Process

Hercules^® Customers

Experience & Training

Partners

FAQs

RADIO FREQUENCY TECHNOLOGY FOR PLASMA APPLICATIONS

This course provides knowledge of RF principles and the ability to plasma processes.

Location: Courses at the Customer Site

Radio Frequency Technology for Plasma Applications
January 19, 2010, Dorint Hotel, Berlin-Adlershof
November, 2010, Dorint Hotel, Berlin-Adlershof

The course includes:

	Contents:		Examples of Contents:
	1. AC Theory Basic electric value Imaginary unit Fundamental laws Voltage driver Ideal and real cables Signal delay 2. RF - Contacts and Connectors RF plasma generation Contact resistance Common adapters and plugs Maximum power load - DC, RF Impedance matching Matching types Resonance, LC oscillation circuit 3. RF Metrology Accuracy of measurement Voltage and current Directional coupler VI-probe 4. Additional Power Coupling Methods Inductive coupling Generation of RF-oscillations Electro-magnetic waves Microwaves, ECR 5. Waves and Reflection Wave propagation and reflection Standing waves Grounding, shielding, EMC


			Experiments: Capacitors of high RF power Wave propagation in cables Damping and RF power loss in cables Cables and connectors for plasma equipments High voltage RF probes RF current probes