PRODUCT GUIDE

Hercules^® at a Glance

Semiconductor Plasma Process Sensor

Photovoltaics Plasma Process Sensor

Total Process Control Solution

PLASMA PROCESS CONTROL

Plasma Control Concept

Plasma Metrology

Data Handling

EXPERIENCE & TRAINING

Training Concept

Plasma School

RF TECHNOLOGY and PROCESS SERVICES

RF Chamber Matching

Spare Part Management

Uniformity Improvement

Large Area Uniformity Simulation

REFERENCES

Tool and Process

Hercules^® Customers

Experience & Training

Partners

FAQs

2011 (c) Plasmetrex GmbH

DATA ANALYSIS by HercViewer and HercLotViewer

Plasmetrex offers two different process analysis tools with the Plasma Metrology System Hercules^® :

HercViewer 3.0	HercLotViewer 2.6

The main new features are: Detailed process and lot analysis First wafer effects Process instabilities Process excursions (arcing) Process influence after process mix (memory effects) Chamber status while conditioning procedure Process comparison by reference curve Improved step-wise analysis	The main new features are: Drift and instabilities within a lot or a wet clean cycle Step-wise analysis First wafer effects Process influence after process change (memory effects) Chamber and recipe comparison Pre-selection of the valid process length before loading data files Second parameter is shown additionally Time resolved curves and extended export function Diagrams ready for presentation
Dear Customers, enclosed please find the new release of HercView (3.0). For download (9 MB) please click here: HercView	Please contact Plasmetrex GmbH for the new version of HercLotViewer.
All commants are desired.