HERCULES^® N smartM

ROBUST SENSOR for MANUFACTURING CONTROL

Quality Management by Process Control

Product:

• Hercules^® smartM N (10 - 40 MHz)
  no DC bias or RF peak voltage measurement point required.

Applications:

• Routine manufacturing control
• Quality control
• Faults Detection and Classification
• Conditioning (seasoning) control
• Chamber matching
• Virtual Metrology
• Pre-process fault detection
• Product monitoring
• Maintenance

Parameters:

• Plasma resistivity, normalized
• Resonance frequency
• Unformity edge
• RF current (1st harmonic)

Measurement range:

• Resitivity: 0.01 ... 10
• Resonance frequency: 10 ... 50 MHz

Pressure range:

• Depends on gas, reactor geometry, and RF power
• Lower limit: typical 50 Pa (380 mTorr)

Pre-conditions:

• Cylindrical chamber geometry
• Flange above wafer in process position, not in shadow of other parts
• Well grounded chamber wall and liner

Chambers:

• Classical PECVD chambers

Model:

• Non-iterative NEED algorithm with low pressure extension

Flexible and small:

• appr. 4 kg
• H: 210 mm, D: 250 mm, W: 210 mm

Data analysis and process control:

• Hercules^® Master
  GUI (Graphical User Interface) for Configuration of Hercules^® and data visualization
• HercView
• HercLotView
• SAPC Server

Interface:

• SEMI 54.24 (Modbus^® TCP)
• Lam^® Plug and Play (optional)
• SECS/HSMS (optional via Hercules^® Master)